Lam Research 810-069751-114 High Precision Semiconductor Process Module

Part Number:810-069751-114

Brand:Lam Research

Module Type:Plasma Etch Module

Voltage Rating:240V

Frequency Range:50/60 Hz

Chamber Size:300mm

Process Gas Types:Cl2, O2, NF3

Etch Rate:100nm/min

Chuck Temperature Range:-5°C to 80°C

Power Output:1500W

Control Interface:Touchscreen

Communication Protocol:Ethernet/IP, Modbus TCP

Certifications:CE, UL, SEMI S2

    The Lam Research 810-069751-114 Plasma Etch Module is engineered for precision etching in semiconductor fabrication.

     With its state-of-the-art design, this module ensures consistent and reliable etching results across a wide range of materials.

     Its advanced control interface and communication protocols make it easy to integrate into existing manufacturing systems.

     The module’s chuck temperature range allows for precise control over the process environment, ensuring optimal results for each application.

     Certified to meet industry standards, this module is a trusted choice for semiconductor manufacturers seeking high-performance plasma etching solutions.